Nanofab News Item
Interim Microfab Substantial Completion
You have been very patient, dear labmembers, as we have worked to upgrade the interim microfab. On June 1, we will hold a substantial completion party, feed you pizza and invite you to come assist with our grand summer cleaning, to rid the facility of construction dust and initiate new cleanroom protocols…
All Labmembers are invited to please come and help with the major cleanup of construction dust, in preparation for launching the new capabilities:
Research Photolithography Bay
• New with new wet benches
• Upgraded control software for the electromask
• New camera for the inspection microscope
Dry Etch Bay
Two Lam etchers (polySi and Nitride) highlight the completion of this bay, which also includes DRIE, XeF2 bulk silicon etching, and a parallel plate RIE for PR strip and general purpose etching.
Wet Etch Bay
Formerly the MEMS teaching lab, this new bay is dedicated to acid and caustic etch operations, and equipped with new wet stations
Surface Lab Annex
Formerly the OMVPE lab, this new lab adjacent to the main microfab entrance houses CMP, polishing tools, flexus wafer bow and XRF.
Note that beginning mid summer (TBD), 1555C will begin remodeling as an extension of the mini-cleanroom, to house nano-imprint, Supercritical drying, ALD and a new furnace stack with LTO/PSG, phos-poly, low-stress silicon nitride, and TEOS.